BUSINESS
ITEM | Applied Specification |
---|---|
적용 Process | 반도체 Wafer Etching & 세정용 |
적용 Size | 4”~15”Wafer |
Spin Motor | AC Seovo Motor를 이용한 회전 Type |
Nozzle Unit | 4~6 Nozzle 설치가능 |
Transfer Unit | 4-axis control with dual arm |
Brush Unit | Nylon612 0.05mm(Ø60~Ø80) |
Utility | Air,N2,DIW |